Intel has begun using ASML's new High NA EUV lithography machines, achieving 30,000 wafer production in a quarter. The machines promise greater reliability—approximately twice that of previous models—and allow for more efficient chip manufacturing by reducing processing steps. Steve Carson from Intel highlighted the impact of these machines on production speed and cost savings. As the first major chipmaker to adopt this technology, Intel aims to develop its cutting-edge 18A manufacturing technology, potentially regaining its competitive edge over rivals like TSMC.
Intel’s early adoption of ASML's High NA EUV lithography machines marks a significant step forward, offering improved reliability and efficiency in chip production.
The High NA machines are showing up to twice the reliability of earlier models and are streamlining production by reducing the number of required exposures and processing steps.
With these new machines, Intel produced 30,000 wafers in a quarter, showcasing the potential for expedited production and a significant turnaround in manufacturing capability.
Intel plans to utilize the High NA machines to develop its 18A manufacturing technology, signaling its resurgence in the competitive chip manufacturing landscape.
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