Prinano has successfully delivered its first self-developed nanoimprint lithography machine, part of the PL-SR series, which produces lines under 10 nanometers. This achievement positions Prinano ahead of Canon's technology, which reaches 14 nanometers. However, the machine is not yet viable for 5nm logic chip production. Nanoimprint lithography, as a cheaper and more energy-efficient alternative to EUV, faces its own limitations regarding speed and complexity for advanced chip designs. This technology is well-suited for simpler memory applications, aligning with China’s aims for technological independence.
Prinano's PL-SR series marks an advancement in nanoimprint lithography, achieving line widths under 10 nanometers, surpassing Canon's technology.
Nanoimprint lithography presents a cost-effective, energy-efficient alternative to EUV technology, although it faces speed and complexity limitations for advanced chips.
The technology is optimal for simpler structures like NAND flash memory, aligning with China's goals to reduce dependency on Western production technologies.
Canon plans to compete in the NIL sector with its system, already partnering with major tech companies for future developments.
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