"The unprecedented system can create structures on silicon wafers that are just 8 nanometres wide, which are thought to be the smallest ever made in a single step by a commercial chip-patterning system."
"Chips with more transistors could help artificial-intelligence data centres to run more computations without using more electricity, addressing the monumental demands for chips."
"The advances were presented by a representative of ASML, which has sent about ten of these EUV devices, costing about US$400 million, to customers including Intel and SK hynix."
A powerful light source has achieved a record by creating 8 nanometre wide structures on silicon wafers, the smallest ever made in a single step. This technology, known as EUV lithography, uses extreme ultraviolet light to pattern silicon wafers coated with light-sensitive chemicals. The new model features enhanced optics, allowing for smaller transistors and increased transistor density, which is crucial for advancing computing and supporting AI data centers. ASML has delivered about ten of these $400 million devices to major chipmakers like Intel and SK hynix.
Read at Nature
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